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Chemical-mechanically polishing large areafree-standing CVD diamond films

ZHANG Pingwei TONG Tingting CAI Yunhong

ZHANG Pingwei, TONG Tingting, CAI Yunhong. Chemical-mechanically polishing large areafree-standing CVD diamond films[J]. 金刚石与磨料磨具工程, 2018, 38(6): 69-72. doi: Code:10.13394/j.cnki.jgszz.2018.6.0013
引用本文: ZHANG Pingwei, TONG Tingting, CAI Yunhong. Chemical-mechanically polishing large areafree-standing CVD diamond films[J]. 金刚石与磨料磨具工程, 2018, 38(6): 69-72. doi: Code:10.13394/j.cnki.jgszz.2018.6.0013
ZHANG Pingwei, TONG Tingting, CAI Yunhong. Chemical-mechanically polishing large areafree-standing CVD diamond films[J]. Diamond & Abrasives Engineering, 2018, 38(6): 69-72. doi: Code:10.13394/j.cnki.jgszz.2018.6.0013
Citation: ZHANG Pingwei, TONG Tingting, CAI Yunhong. Chemical-mechanically polishing large areafree-standing CVD diamond films[J]. Diamond & Abrasives Engineering, 2018, 38(6): 69-72. doi: Code:10.13394/j.cnki.jgszz.2018.6.0013

Chemical-mechanically polishing large areafree-standing CVD diamond films

doi: Code:10.13394/j.cnki.jgszz.2018.6.0013
详细信息
  • 中图分类号: TG175

Chemical-mechanically polishing large areafree-standing CVD diamond films

  • 摘要: Chemical mechanical polishing is used to polish large area free-standing CVD diamond films with diameters of 66 mm. The influence of polishing plates (iron plate, asphalt plate and soft cushion) and oxidizing agents (K2S2O8 and K2FeO4) on polishing results are investigated. Profilometer (tip radius 5 μm), optical microscope and Raman spectroscopy are used to evaluate the polishing effects of the CVD diamond films. Results show that the material removal rate of iron plate is the highest, while the surface polished by soft cushion is the most uniform with roughness of 2 nm. It is also found that the most effective oxidizing agent is K2FeO4. In conclusion, the optimum polishing conditions are soft cushion and K2FeO4.

     

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出版历程
  • 修回日期:  2018-11-27
  • 网络出版日期:  2022-07-10

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