双平面研磨Si<sub>3</sub>N<sub>4</sub>圆柱滚子的表面质量

黄贺利; 李颂华; 吴玉厚; 孙健; 王鹏飞; 赵梓辰

doi:10.13394/j.cnki.jgszz.2022.0165

双平面研磨Si₃N₄圆柱滚子的表面质量

doi: 10.13394/j.cnki.jgszz.2022.0165

黄贺利¹,
李颂华^{1, 2,},
吴玉厚^{1, 2},
孙健¹,
王鹏飞¹,
赵梓辰¹

1.
沈阳建筑大学机械工程学院, 沈阳 110168
2.
高档石材数控加工装备与技术国家地方联合工程实验室, 沈阳 110168

基金项目: 国家自然科学基金（51975388）；国防科技创新特区计划（20-163-00-TS-006-002-11）；辽宁省教育厅高等学校基本科研项目（LJKZ0597）；辽宁省自然科学基金（2020-BS-159）；辽宁“百千万工程人才工程”培养经费资助项目（辽人社涵（2021）79号）。

详细信息

作者简介:
李颂华，男，1977年生，教授、博士。主要研究方向：难加工材料高效精密加工工艺与装备、高性能数控机床主轴系统等。E-mail：rick_li2000@163.com

中图分类号: TG58; TQ164
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- 被引次数: 0
出版历程
- 收稿日期: 2022-09-29
- 修回日期: 2022-11-18
- 录用日期: 2023-12-05
- 刊出日期: 2023-06-20

Surface quality of double-sided grinding Si₃N₄cylindrical rollers

1.
School of Mechanical Engineering, Shenyang Jianzhu University, Shenyang 110168, China
2.
National-Local Joint Engineering Laboratory of NC Machining Equipment and Technology of High-Grade Stone, Shenyang 110168, China

摘要

摘要:
为获得双平面研磨Si₃N₄圆柱滚子的最佳工艺参数组合，采用正交试验法，探究研磨盘转速、研磨压力和磨粒基本颗粒尺寸对其表面质量和去除效率的影响规律，并以工件的表面粗糙度和材料去除效率作为研磨最佳工艺参数的优选依据。结果表明：随着研磨盘转速和研磨压力的增大，工件表面粗糙度先减小后增大；且磨粒基本颗粒尺寸和工件表面粗糙度、研磨盘转速和研磨压力和去除效率均呈正相关。Si₃N₄圆柱滚子研磨的最佳工艺参数组合是金刚石磨粒基本颗粒尺寸为2.6 μm、研磨盘转速为20 r/min、研磨压力为0.15 MPa；在此最优参数下，可获得表面粗糙度为0.0486 μm、材料去除效率为1.20 μm/min的光滑无损伤Si₃N₄圆柱滚子。
- 双平面研磨 /
- Si₃N₄圆柱滚子 /
- 表面粗糙度 /
- 去除效率
Abstract:
In order to obtain the optimal process parameter combination of double-sided grinding Si₃N₄ cylindrical rollers, the orthogonal experiment method was used to explore the influences of the grinding disc speeds, the grinding pressures and the basic particle sizes of the abrasive particles on the surface quality and the removal efficiency of Si₃N₄ cylindrical rollers. The results of the surface roughness and the material removal efficiency of the specimen are taken as the basis for optimizing the grinding process parameters. The results show that the surface roughness of the specimen first decreases and then increases with the increase of the grinding disc pressure and the grinding speed. The basic particle sizes of the abrasive are positively correlated with the surface roughness of the specimen, while the grinding disc speed and the grinding pressure are positively correlated with the removal efficiency. The optimum combination of grinding parameters for Si₃N₄ cylindrical rollers is that the basic particle size of diamond abrasive is 2.6 μm, the grinding disc speed is 20 r/min and the grinding pressure is 0.15 MPa. Under the optimal parameters, the smooth and undamaged Si₃N₄ cylindrical rollers with surface roughness of 0.0486 μm and removal efficiency of 1.20 μm/min can be obtained.
- double-sided grinding /
- Si₃N₄ cylindrical roller /
- surface roughness /
- removal efficiency

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图 1 游离磨料研磨加工材料去除模型

Figure 1. Material removal model of free abrasive grinding

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图 2 工件表面的微观形貌

Figure 2. Microtopography of the workpiece surface

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图 3 双面研磨机结构及原理图

Figure 3. Structure and schematic diagram of double-side grinder

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图 4 粗磨后的Si₃N₄陶瓷滚子工件

Figure 4. Si₃N₄ ceramic roller workpiece after rough grinding

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图 5 Si₃N₄圆柱滚子工件位置

Figure 5. Si₃N₄cylindrical roller workpiece positions

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图 6 研磨盘转速对R_a 及材料去除效率的影响

Figure 6. Effects of rotating speed of lapping disc on R_a and material removal efficiency

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图 7 金刚石磨粒基本颗粒尺寸对R_a及去除效率的影响

Figure 7. Effects of basic particle sizes of diamond abrasive grain on R_a and removal efficiency

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图 8 不同基本颗粒尺寸磨粒研磨后的Si₃N₄工件表面形貌

Figure 8. Si₃N₄ workpiece surface morphologies ground with abrasive particles of different basic particle sizes

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图 9 研磨压力对R_a及材料去除效率的影响

Figure 9. Effects of grinding pressures on R_a and material removal efficiency

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图 10 光滑无损伤的Si₃N₄圆柱滚子

Figure 10. Smooth and undamaged Si₃N₄cylindrical rollers

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图 11 试验前后R_a对比

Figure 11. R_a comparison before and after grinding

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表 1 Si₃N₄陶瓷材料性能参数

Table 1. Si₃N₄ material performance parameters

性能指标	数值
密度 ρ / (g∙cm⁻³)	3.26
弹性模量 E / GPa	310
硬度 H / GPa	16
泊松比 ε	0.25
断裂韧性 K_IC / (MPa∙m⁻²)	7.0
压碎载荷比 R	40
线膨胀系数 λ / K⁻¹	3.2 × 10⁻⁶

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表 2 试验因素及水平

Table 2. Experimental factors and levels

水平		因素
水平	研磨盘转速 n / (r∙min⁻¹) A	金刚石磨粒基本颗粒尺寸 D₅₀ / μm B	研磨压力 p / MPa C
1	14	15.0	0.05
2	17	6.5	0.10
3	20	2.6	0.15
4	23	1.3	0.20

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表 3 正交试验结果

Table 3. Orthogonal experimental results

组号	A	B	C	表面粗糙度 R_a / μm	去除效率 η / (μm∙min⁻¹)
1	14	15.0	0.05	0.0758	0.46
2	14	6.5	0.10	0.0683	0.83
3	14	2.6	0.15	0.0409	1.00
4	14	1.3	0.20	0.0410	1.01
5	17	15.0	0.10	0.0699	0.99
6	17	6.5	0.15	0.0658	0.99
7	17	2.6	0.20	0.0444	1.07
8	17	1.3	0.05	0.0310	0.54
9	20	15.0	0.15	0.0633	1.04
10	20	6.5	0.20	0.0531	1.34
11	20	2.6	0.05	0.0394	0.75
12	20	1.3	0.10	0.0321	1.01
13	23	15.0	0.20	0.0885	1.51
14	23	6.5	0.05	0.0755	0.94
15	23	2.6	0.10	0.0699	1.07
16	23	1.3	0.15	0.0273	1.48

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表 4 R_a响应表

Table 4. R_a response table

水平	A	B	C
1	0.0565	0.0438	0.0739
2	0.0527	0.0486	0.0600
3	0.0470	0.0657	0.0493
4	0.0653	0.0743	0.0567
极差	0.0183	0.0306	0.0246

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表 5 材料去除效率响应表

Table 5. Material removal efficiency response table

水平	A	B	C
1	0.83	1.01	0.67
2	0.90	0.97	0.98
3	1.03	1.03	1.13
4	1.25	1.00	1.23
极差	0.42	0.06	0.56

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