Preparation of diamond films by low power MPCVD
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摘要: 通过微波等离子体化学气相沉积(MPCVD)法,以CH4/H2为气源,合成高质量金刚石薄膜,在150 W低微波功率下,从衬底预处理方法、沉积气压、流量比等方面对制备高质量金刚石薄膜的工艺参数进行研究。结果表明:高流量比不利于金刚石颗粒的粒径控制,二次形核的存在可以获得近纳米级颗粒尺寸的金刚石薄膜;较大的沉积气压有利于制备致密均匀的金刚石薄膜;衬底预处理对薄膜的有效沉积影响明显,其中利用含金刚石粉末的甲醇悬浊液进行超声处理是最有效的种晶方法。Abstract: High-quality diamond films are prepared using CH4/H2 gas by the microwave plasma chemical vapor deposition (MPCVD) method. Under 150 W low microwave power, the influences of the substrate pretreatment method, deposition pressure, and volume ratio for preparing high-quality diamond films are studied. The results show that the high volume ratio is not conducive to the size control of diamond particles, and the presence of secondary nucleation can obtain diamond films with near nanometer particle size; the larger deposition pressure is conducive to the preparation of dense and uniform diamond films. The impact of substrate pretreatment for the film deposition is obvious, and the ultrasonic treatment with a methanol suspension containing diamond powder is the most effective seeding method.
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Key words:
- microwave plasma /
- chemical vapor deposition /
- diamond film /
- low power
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