Influence of deposition pressure on micron-nanometer transition of diamond film
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摘要: 利用热丝化学气相沉积(HFCVD)装置研究不同气压下氩气体积分数对金刚石膜晶粒尺寸的影响,并对不同气压下其微米纳米尺寸转变的临界值进行分析,同时用SEM以及拉曼光谱对沉积的金刚石膜进行分析。结果表明:随着氩气体积分数的增大,金刚石膜的晶粒会越来越小,但不同气压下金刚石膜从微米转变成纳米级别所需要的氩气体积分数不一样;在2.0~0.5 kPa范围内,随着气压的降低,转变所需的氩气体积分数逐步降低,从2.0 kPa时需要60.0%,到1.5 kPa时需要52.5%,再到1.0 kPa时需要32.5%降至0.5 kPa时仅需20.0%。在临界点得到的金刚石膜的质量与内应力也不相同,随着气压降低,膜的质量提高,内应力增大。Abstract: The effect of argon concentration on the grain size of diamond film at different pressures was studied by hot fibre chemical vapor deposition (CVD) device, and the critical value of the size transition at different pressures was analyzed. The diamond films were analyzed by SEM and Raman spectroscopy. Results show that with the increase of argon volume fraction, the grain size of diamond film will be smaller and smaller, but the argon volume fraction required for the conversion of diamond film from micron to nanometer varies at different pressures. As the pressure decreases, the concentration of argon scale required for the transition decreases gradually. In the range of 2 kPa to 500 Pa, the argon proportion required for the transition is progressively reduced. The volume fraction of Ar decreases from 60.0% at 2.0 kPa to 52.5% at 1.5 kPa, then 32.5% at 1.0 kPa and finally 20.0% at 0.5 kPa. The quality and internal stress of the diamond films obtained at the critical points are also different. With the decrease of air pressure, the quality of the film increases and so does the internal stress.
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Key words:
- hot filament CVD /
- diamond film /
- air pressure /
- micron nanometer transformation
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