Influence of dual-substrate structure on growth of single crystal diamond by MPCVD
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摘要: 在波导耦合的微波等离子体化学气相沉积制备金刚石的装置中引入双基片台结构,用光谱仪测量等离子体的发射光谱,用Raman光谱仪和SEM分析生长的单晶金刚石的Raman位移和表面形貌,对比研究双基片台结构对等离子体发射光谱和单晶金刚石生长的影响。研究表明:双基片台结构可以提高等离子体的功率密度。在相同的沉积参数下,双基片台结构有利于提高等离子体发射光谱的强度,从而显著提高单晶金刚石的生长速率,最快可达到24 μm/h。生长的单晶金刚石具有金刚石Raman特征峰的偏移度更小,Raman特征峰的半高宽更窄,非金刚石相含量更少的特点。Abstract: A novel structure of double substrates is put forward for a microwave plasma chemical vapor deposition equipment which is used to grow single crystal diamond. Optical Emission Spectrometer (OES) is used to diagnose the intensity of the groups in the plasma, while Raman Spectra and Scanning Electron Microscopy are used to analyze Raman displacement and surface appearance of the single crystal diamond. The effects of the double substrates on OES of the plasma and the growth of single crystal diamond have been studied. The results show that the plasma power density can be enhanced with double substrates. The intensity of OES can be improved with double substrates and resulting in a higher growth rate of single crystal diamond at the same diamond deposition parameters. The single crystal diamond deposited has characteristic of less Raman displacement, smaller full width at half maximum of Raman spectrum and less impurity phases.
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Key words:
- emission spectroscopy /
- Raman displacement /
- surface appearance /
- power density
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