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三氯化铁-草酸体系不锈钢化学机械抛光液设计与优化

王泽宇 彭亚男 苏建修 陈佳鹏

王泽宇, 彭亚男, 苏建修, 陈佳鹏. 三氯化铁-草酸体系不锈钢化学机械抛光液设计与优化[J]. 金刚石与磨料磨具工程, 2023, 43(4): 497-503. doi: 10.13394/j.cnki.jgszz.2022.0159
引用本文: 王泽宇, 彭亚男, 苏建修, 陈佳鹏. 三氯化铁-草酸体系不锈钢化学机械抛光液设计与优化[J]. 金刚石与磨料磨具工程, 2023, 43(4): 497-503. doi: 10.13394/j.cnki.jgszz.2022.0159
WANG Zeyu, PENG Yanan, SU Jianxiu, CHEN Jiapeng. Design and optimization of ferric chloride and oxalic acid based slurry to chemically mechanically polish stainless steel[J]. Diamond & Abrasives Engineering, 2023, 43(4): 497-503. doi: 10.13394/j.cnki.jgszz.2022.0159
Citation: WANG Zeyu, PENG Yanan, SU Jianxiu, CHEN Jiapeng. Design and optimization of ferric chloride and oxalic acid based slurry to chemically mechanically polish stainless steel[J]. Diamond & Abrasives Engineering, 2023, 43(4): 497-503. doi: 10.13394/j.cnki.jgszz.2022.0159

三氯化铁-草酸体系不锈钢化学机械抛光液设计与优化

doi: 10.13394/j.cnki.jgszz.2022.0159
基金项目: 江苏省精密与微细制造技术重点实验室开放基金,国家自然科学基金面上项目(51375149)
详细信息
    作者简介:

    王泽宇,男,1979年生,讲师。主要研究方向:人工智能大数据处理。E-mail:18738593090@163.com

    通讯作者:

    陈佳鹏,男,1991年生,讲师、博士、硕士生导师。主要研究方向:超精密加工理论与技术。E-mail:34210007@sues.edu.cn

  • 中图分类号: TG732; TH162; TN27

Design and optimization of ferric chloride and oxalic acid based slurry to chemically mechanically polish stainless steel

  • 摘要: 为提高柔性显示衬底不锈钢箔片化学机械抛光加工效率,研制一种三氯化铁-草酸型抛光液并用于304不锈钢衬底的化学机械抛光加工过程。设计正交优化试验,确定磨粒粒径、磨料含量、草酸含量和三氯化铁含量对材料去除率和表面粗糙度(Sa)的影响显著性顺序,并重点探究三氯化铁和草酸对材料去除率的影响规律。利用优化后的抛光液精抛304不锈钢,其材料去除率高于560 nm/min,抛光30 min后Sa低于8 nm。相比现有抛光液的材料去除效率(226.56 nm/min),新抛光液的加工效率提升超过1倍。

     

  • 图  1  抛光过程的设备(a)和工艺参数(b)

    Figure  1.  Device (a) and parameters (b) of polishing

    图  2  抛光液组分对304不锈钢DMRR(a)和Sa(b)的影响

    Figure  2.  Effects of polishing slurry components on DMRR (a) and Sa (b) of 304 stainless steel

    图  3  磨粒粒径对DMRRSa的显著性分析

    Figure  3.  Significance analysis for effect of abrasive particle size on DMRR and Sa

    图  4  磨料含量对DMRRSa的显著性分析

    Figure  4.  Significance analysis for effect of abrasive content on DMRR and Sa

    图  5  草酸含量对DMRRSa的显著性分析

    Figure  5.  Significance analysis for oxalic acid content on DMRR and Sa

    图  6  三氯化铁含量对DMRRSa的显著性分析

    Figure  6.  Significance analysis for effect of ferric chloride content on DMRR and Sa

    图  7  304不锈钢精抛后的(a)二维和(b)三维表面形貌

    Figure  7.  2D (a) and 3D (b) surface morphology of polished 304 stainless steel by optimizational slurry

    表  1  三氯化铁-草酸型抛光液正交试验

    Table  1.   Orthogonal test for ferric chloride and oxalic acid type of polishing slurry

    水平因素
    abcdef


    磨料质

    分散剂

    草酸质

    三氯化铁

    活性剂


    量分数

    质量分数

    量分数

    质量分数

    质量分数
    d
    / μm
    wg
    / %
    wd
    / %
    wo
    / %
    wf
    / %
    wa
    / %
    10.50.80.40.420.04
    27.04.01.20.860.20
    314.07.22.01.2100.40
    428.09.62.81.6140.80
    下载: 导出CSV

    表  2  三氯化铁-草酸型抛光液组分优化试验数据表

    Table  2.   Experimental data for ferric chloride and oxalic acid type of polishing slurry optimization

    序号abcdefDMRR
    nm/min
    Sa
    nm
    10.50.80.40.420.04325.313
    20.54.01.20.860.20558.611
    30.57.22.01.2100.40502.38
    40.59.62.81.6140.80430.29
    57.00.80.40.860.40495.212
    67.04.01.20.420.80486.229
    77.07.22.01.6140.04509.521
    87.09.62.81.2100.20533.619
    914.00.81.21.2140.4503.519
    1014.04.00.41.6100.20595.617
    1114.07.22.80.460.04605.636
    1214.09.62.00.820.80560.723
    1328.00.81.21.6100.40588.329
    1428.04.00.41.2140.80624.327
    1528.07.22.80.820.04617.436
    1628.09.62.00.460.20674.423
    170.50.82.80.4140.20402.713
    180.54.02.00.8100.04550.311
    190.57.21.21.260.80502.48
    200.59.60.41.620.40389.19
    217.00.82.80.8100.80502.312
    227.04.02.00.4140.40548.729
    237.07.21.21.620.20483.721
    247.09.60.41.260.04518.619
    2514.00.82.01.220.20520.719
    2614.04.02.81.660.04641.317
    2714.07.20.40.4100.80537.836
    2814.09.61.20.8140.40565.623
    2928.00.82.01.660.80563.429
    3028.04.02.81.220.40576.827
    3128.07.20.40.8140.20551.336
    3228.09.61.20.4100.04541.723
    下载: 导出CSV

    表  3  抛光液各组分对MRR的影响显著性分析

    Table  3.   Significance analysis for effect of each component of polishing slurry on MRR

    因素自由度离均差平方和均方和FPr > F
    a 3 259 966.862 5 86 655.621 192.93 <0.000 1
    b 3 88 715.559 4 29 571.853 65.84 <0.000 1
    c 3 30 639.930 0 10 213.310 22.74 <0.000 1
    d 3 15 975.215 5 5 325.072 11.86 <0.000 1
    e 3 76 268.718 9 25 422.906 56.60 <0.000 1
    f 3 3 389.954 0 1 129.985 2.52 0.064 5
    下载: 导出CSV

    表  4  抛光液各组分对Sa的影响显著性分析

    Table  4.   Significance analysis for effect of each component of polishing slurry on Sa

    因素自由度离均差平方和均方和FPr > F
    a 3 0.004 404 00 0.001 468 00 68.44 <0.000 1
    b 3 0.000 759 00 0.000 253 00 11.80 <0.000 1
    c 3 0.000 013 50 0.000 004 50 0.21 0.889 3
    d 3 0.000 711 00 0.000 237 00 11.05 <0.000 1
    e 3 0.000 181 50 0.000 0605 0 2.82 0.044 4
    f 3 0.000 073 50 0.000 0245 0 1.14 0.337 4
    下载: 导出CSV
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  • 收稿日期:  2022-09-20
  • 修回日期:  2022-11-20
  • 录用日期:  2022-11-30
  • 刊出日期:  2023-08-30

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