Abstract: Aiming at the high-quality processing requirements of the resin-rich layer reflecting surface of the new generation antenna, the resin-rich layer polishing process experiment was carried out to study the effects of polishing time, abrasive particle size, abrasive particle concentration, loading pressure and polishing speed on the surface roughness of the resin-rich layer. The results show that: under the current experimental conditions, the surface roughness first decreases, then tends to be stable with the increase of polishing time, increases with the increase of the abrasive particle size, first decreases and then increases with the increase of the abrasive particle concentration, increases with the increase of the loading pressure, and decreases first with the increase of the polishing speed, increased later. On this basis, an optimized process parameter combination is formed to obtain a high-quality resin-rich polished surface with a surface roughness of S_a 4.73 nm.