CN 41-1243/TG ISSN 1006-852X

留言板

尊敬的读者、作者、审稿人, 关于本刊的投稿、审稿、编辑和出版的任何问题, 您可以本页添加留言。我们将尽快给您答复。谢谢您的支持!

姓名
邮箱
手机号码
标题
留言内容
验证码

聚集体金刚石磨料研磨加工性能研究

方伟松 阎秋生 潘继生 路家斌 陈海阳

方伟松, 阎秋生, 潘继生, 路家斌, 陈海阳. 聚集体金刚石磨料研磨加工性能研究[J]. 金刚石与磨料磨具工程, 2023, 43(6): 684-692. doi: 10.13394/j.cnki.jgszz.2022.0218
引用本文: 方伟松, 阎秋生, 潘继生, 路家斌, 陈海阳. 聚集体金刚石磨料研磨加工性能研究[J]. 金刚石与磨料磨具工程, 2023, 43(6): 684-692. doi: 10.13394/j.cnki.jgszz.2022.0218
FANG Weisong, YAN Qiusheng, PAN Jisheng, LU Jiabin, CHEN Haiyang. Study on lapping performance of agglomerated diamond abrasive[J]. Diamond & Abrasives Engineering, 2023, 43(6): 684-692. doi: 10.13394/j.cnki.jgszz.2022.0218
Citation: FANG Weisong, YAN Qiusheng, PAN Jisheng, LU Jiabin, CHEN Haiyang. Study on lapping performance of agglomerated diamond abrasive[J]. Diamond & Abrasives Engineering, 2023, 43(6): 684-692. doi: 10.13394/j.cnki.jgszz.2022.0218

聚集体金刚石磨料研磨加工性能研究

doi: 10.13394/j.cnki.jgszz.2022.0218
基金项目: 国家自然科学基金(U1801259);佛山市科技创新项目(2018IT100242)。
详细信息
    通讯作者:

    阎秋生,男,1962年出生,博士、教授、博士研究生导师。主要研究方向:光电子/微电子硬脆材料超精密加工理论与技术、材料节能节材加工技术等。E-mail:qsyan@gdut.edu.cn

  • 中图分类号: TG732; TH162

Study on lapping performance of agglomerated diamond abrasive

  • 摘要:

    为实现蓝宝石等硬脆材料的高效率、低表面粗糙度研磨加工,提出利用陶瓷结合剂和微细金刚石磨料(粒径3 μm)烧结制成聚集体金刚石磨料(平均粒径30 μm)进行研磨加工新工艺。通过与3 μm和30 μm等2种单晶金刚石磨料对蓝宝石基片进行研磨加工对比实验,系统研究聚集体金刚石磨料的研磨性能。结果表明:聚集体金刚石磨料具有较高的材料去除率,相同条件下聚集体金刚石磨料加工15 min时材料去除率为1.127 μm/min;聚集体金刚石磨料具有较好的加工稳定性,研磨120 min时材料去除率为0.483 μm/min,相比于加工15 min时下降57.14%,而3 μm单晶金刚石磨料则下降78.02%;聚集体金刚石磨料与3 μm单晶金刚石磨料研磨蓝宝石的表面粗糙度相近,分别为Ra 9.45 nm和Ra 8.75 nm,远低于30 μm单晶金刚石磨料的Ra 246 nm。聚集体金刚石磨料能实现低加工表面粗糙度和高材料去除率的机理可以归纳为:多磨粒微刃产生去除作用可以获得低表面粗糙度,同时具有自锐性,提高材料去除效率并保证加工过程的稳定。

     

  • 图  1  聚集体金刚石磨料形貌

    Figure  1.  Morphology of polymerized diamond abrasives

    图  2  研磨加工装置

    Figure  2.  Lapping and machining plant

    图  3  研磨过程MRR变化曲线

    Figure  3.  MRR variation curve in lapping process

    图  4  研磨过程Δmv变化曲线

    Figure  4.  Variation curve of Δmv in lapping process

    图  5  研磨过程Ra变化曲线

    Figure  5.  Variation curve of Ra in lapping process

    图  6  工件加工表面形貌

    Figure  6.  Surface topography of lapping workpiece

    图  7  磨料原始表面形貌

    Figure  7.  Abrasives original surface morphology

    图  8  研磨120 min磨料表面形貌

    Figure  8.  Surface morphology of abrasives after 120 min lapping

    图  9  聚集体金刚石磨料研磨120 min内的形貌变化

    Figure  9.  Morphologic changes of agglomerated diamond abrasives after 120 min lapping

    图  10  研磨液组分粒径尺寸统计分析

    Figure  10.  Statistical analysis of particle size in lapping liquid

    图  11  金刚石磨料研磨过程受力模型

    Figure  11.  Force model of diamond abrasive lapping process

    图  12  金刚石磨料磨损过程示意图

    Figure  12.  Schematic diagram of diamond abrasive wear process

    表  1  金刚石磨料参数

    Table  1.   Diamond abrasive parameters

    型号粒径范围 d / μm种类
    W32~4单晶金刚石
    W3020~40单晶金刚石
    聚集体金刚石20~40(类)多晶金刚石
    下载: 导出CSV
  • [1] SEO J, KIM T, LEE H. Effect of free abrasives on material removal in lap grinding of sapphire substrate [J]. Tribology and Lubricants,2018,34(6):209-216.
    [2] CHUNG C, KORACH C S, KAO I. Experimental study and modeling of lapping using abrasive grits with mixed sizes [J]. Journal of Manufacturing Science and Engineering,2011,133(3):031006. doi: 10.1115/1.4004137
    [3] BHAGAVAT S, LIBERATO J C, CHUNG C, et al. Effects of mixed abrasive grits in slurries on free abrasive machining (FAM) processes [J]. International Journal of Machine Tools and Manufacture,2010,50(9):843-847. doi: 10.1016/j.ijmachtools.2010.04.006
    [4] NIU F, WANG K, SUN T, et al. Lapping performance of mixed-size agglomerated diamond abrasives in fixed abrasives pads [J]. Diamond and Related Materials,2021,118:108499. doi: 10.1016/j.diamond.2021.108499
    [5] ZHANG L, ZHU L, ZHOU T, et al. Study on the grinding characteristics of sapphire with the assistant of cerium oxide liquid [J]. Materials & Design,2022,215:110451. doi: 10.1016/j.matdes.2022.110451
    [6] HU X, SONG Z, PAN Z, et al. Planarization machining of sapphire wafers with boron carbide and colloidal silica as abrasives [J]. Applied Surface Science,2009,255(19):8230-8234. doi: 10.1016/j.apsusc.2009.05.056
    [7] XU Y, LU J, XU X. Study on planarization machining of sapphire wafer with soft-hard mixed abrasive through mechanical chemical polishing [J]. Applied Surface Science,2016,389:713-720. doi: 10.1016/j.apsusc.2016.07.155
    [8] CHEN J, ZHU Y, PENG Y, et al. Silica-assisted fixed agglomerated diamond abrasive polishing [J]. Journal of Manufacturing Processes,2020,59:595-603. doi: 10.1016/j.jmapro.2020.09.013
    [9] HUANG S, LI X, ZHAO Y, et al. A novel lapping process for single-crystal sapphire using hybrid nanoparticle suspensions [J]. International Journal of Mechanical Sciences,2021,191:106099. doi: 10.1016/j.ijmecsci.2020.106099
    [10] ZHANG B, LEI H, CHEN Y. Preparation of Ag2O modified silica abrasives and their chemical mechanical polishing performances on sapphire [J]. Friction,2017,5(4):429-436. doi: 10.1007/s40544-017-0156-8
    [11] CHEN J, SUN T, SU J, et al. A novel agglomerated diamond abrasive with excellent micro-cutting and self-sharpening capabilities in fixed abrasive lapping processes [J]. Wear,2021,464-465:203531. doi: 10.1016/j.wear.2020.203531
    [12] 邹芹, 向刚强, 王瑶, 等. 聚晶金刚石的研究进展与展望 [J]. 金刚石与磨料磨具工程,2021,41(3):23-32. doi: 10.13394/j.cnki.jgszz.2021.3.0004

    ZOU Qin, XIANG Gangqiang, WANG Yao, et al. Research progress and prospect of polycrystalline diamond [J]. Diamond & Abrasives Engineering,2021,41(3):23-32. doi: 10.13394/j.cnki.jgszz.2021.3.0004
    [13] 朱永伟, 沈琦, 王子琨, 等. 多晶金刚石固结磨料研磨垫精研石英玻璃的性能探索 [J]. 红外与激光工程,2016,45(10):26-31. doi: 10.3788/IRLA201645.1003003

    ZHU Yongwei, SHEN Qi, WANG Zikun, et al. Lapping performance on quartz glass of fixed abrasive pad embedded with multi-grain diamond grits [J]. Infrared and Laser Engineering,2016,45(10):26-31. doi: 10.3788/IRLA201645.1003003
    [14] WANG Z, NIU F, ZHU Y, et al. Comparison of lapping performance between fixed agglomerated diamond pad and fixed single crystal diamond pad [J]. Wear,2019,432/433:202963. doi: 10.1016/j.wear.2019.202963
    [15] SHI H, RING T A. CMP pad wear and polish-rate decay modeled by asperity population balance with fluid effect [J]. Microelectronic Engineering,2010,87(11):2368-2375. doi: 10.1016/j.mee.2010.04.010
    [16] ANDERSON D, WARKENTIN A, BAUER R. Comparison of spherical and truncated cone geometries for single abrasive-grain cutting [J]. Journal of Materials Processing Technology,2012,212(9):1946-1953. doi: 10.1016/j.jmatprotec.2012.04.021
    [17] BOZKAYA D, MÜFTÜ S. A material removal model for CMP based on the contact mechanics of pad, abrasives, and wafer [J]. Journal of the Electrochemical Society,2009,156(12):H890. doi: 10.1149/1.3231691
    [18] CHEN J, ZHU Y, WANG J, et al. Relationship between mechanical properties and processing performance of agglomerated diamond abrasive compared with single diamond abrasive [J]. Diamond and Related Materials,2019,100:107595. doi: 10.1016/j.diamond.2019.107595
    [19] MATSUO T, TOYOURA S, OSHIMA E, et al. Effect of grain shape on cutting force in superabrasive single-grit tests [J]. CIRP Annals - Manufacturing Technology,1989,38(1):323-326. doi: 10.1016/S0007-8506(07)62714-0
  • 加载中
图(12) / 表(1)
计量
  • 文章访问数:  467
  • HTML全文浏览量:  249
  • PDF下载量:  65
  • 被引次数: 0
出版历程
  • 收稿日期:  2022-12-14
  • 修回日期:  2023-01-16
  • 录用日期:  2023-02-27
  • 刊出日期:  2023-12-01

目录

    /

    返回文章
    返回